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Extreme Ultraviolet Lithography Harry J. Levinson
Extreme Ultraviolet Lithography
Harry J. Levinson
Covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Each topic is approached from the perspective of a practicing lithographer.
245 pages
| Medios de comunicación | Libros Book |
| Publicado | 30 de diciembre de 2020 |
| ISBN13 | 9781510639393 |
| Editores | SPIE Press |
| Páginas | 245 |
| Dimensiones | 252 × 176 × 16 mm · 440 g |