Ion Beam Induced Nanoscale Ripples on Si, Tio2 and Ti Surfaces - Maria C. Fravventura - Libros - LAP LAMBERT Academic Publishing - 9783659488139 - 7 de noviembre de 2013
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Ion Beam Induced Nanoscale Ripples on Si, Tio2 and Ti Surfaces

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In this work the roughening effect of grazing incidence ion-bombardment on a variety of inorganic surfaces is discussed. With a combination of experimental and theoretical investigations, the dynamic formation of nanoscopic periodic surface ripples is described as function of incident angle, ion fluence and temperature. Our results show the universality of the ripple formation on semiconducting, metallic and insulating surfaces. Among numerous promising applications, this research establishes the ion-bombardment technique as a valid bottom-up method for nano-patterning to be used as a cost-efficient alternative to conventional top-down lithography in semiconductors technology.

Medios de comunicación Libros     Paperback Book   (Libro con tapa blanda y lomo encolado)
Publicado 7 de noviembre de 2013
ISBN13 9783659488139
Editores LAP LAMBERT Academic Publishing
Páginas 92
Dimensiones 150 × 6 × 225 mm   ·   155 g
Lengua Alemán